Copper Target for PVD

Industrial-grade 99.99% copper sputtering targets for PVD and thin-film deposition. Stable evaporation rate and excellent film uniformity.

Our sputtering targets are produced using high-purity copper (99.99%) with extremely low oxygen and impurity content. Each target provides:

• Stable sputtering rate

• Uniform thin-film deposition

• Low defect density

• High electrical and thermal conductivity

Used in:

• Semiconductor R&D

• Thin-film coating

• Optical coatings

• R&D laboratories

• Industrial PVD systems

We support round, rectangular, custom shapes.